PHOTOCURABLE COMPOSITION, DENTURE BASE, AND REMOVABLE DENTURE

Title:

PHOTOCURABLE COMPOSITION, DENTURE BASE, AND REMOVABLE DENTURE

Document Type and Number:

WIPO Patent Application WO/2018/025943

Kind Code:

A1

Abstract:

A photocurable composition which can be used for the production of a dental prosthesis or the like by stereolithography and comprises a photopolymerization initiator and a (meth)acrylic monomer component, wherein the (meth)acrylic monomer component contains both an acrylic monomer (X) having no aromatic ring, having a cyclic structure other than an aromatic ring and at least two acryloyloxy groups per molecule, and having a Mw of 200 to 800 and at least one (meth)acrylic monomer selected from a (meth)acrylic monomer (A) having at least one ether bond and two (meth)acryloyloxy groups per molecule and having a Mw of 200 to 400, a (meth)acrylic monomer (B) having a cyclic structure other than an aromatic ring and one (meth)acryloyloxy group per molecule and having a Mw of 130 to 240, a (meth)acrylic monomer (C) having a hydrocarbon backbone and two (meth)acryloyloxy groups per molecule and having a Mw of 190 to 280 and a (meth)acrylic monomer (D) having at least one aromatic ring and one (meth)acryloyloxy group per molecule and having a Mw of 140 to 350 inclusive.

Inventors:

SAKAMAKI TOSHIKAZU (JP)
KOJIMA KOUYA (JP)
SHIODE HIROHISA (JP)
KIMURA MAI (JP)

Application Number:

PCT/JP2017/028150

Publication Date:

February 08, 2018

Filing Date:

August 02, 2017

Export Citation:

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Assignee:

MITSUI CHEMICALS INC (JP)

International Classes:

A61K6/083; A61K6/00

Domestic Patent References:

WO2015017556A1

2015-02-05

Foreign References:

JP2016505525A

2016-02-25

Other References: