Title:
PHOTOCURABLE COMPOSITION FOR FORMATION OF RESIN PATTERN, AND PATTERN FORMATION METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2011/129005
Kind Code:
A1
Abstract:
Disclosed are: a photocurable composition for forming a resin pattern by light imprint lithography, which can be removed readily from a substrate or the like after the composition is photocured and which enables the production of a photocured article having good strength and sensitivity; and a pattern formation method using the photocurable composition.
The photocurable composition for forming a resin pattern contains a photopolymerizable compound (A) which comprises one or more photopolymerizable compounds each having only one photopolymerizable group per molecule and a photopolymerization initiator (B), wherein the content ratio of the photopolymerizable compound (A) relative to the total amount of the photopolymerizable compounds contained in the photocurable composition is 99 mass% or more, and the glass transition temperature (Tg) of the photopolymerizable compound (A) as determined in accordance with formula (1) is 313 K or more.
(1)
In the formula, Tgi represents the glass transition temperature (K) of a homopolymer of a photopolymerizable compound (i) that is used as the photopolymerizable compound (A) and has only one photopolymerizable group per molecule; Wi represents the fraction (%) of the mass of the photopolymerizable compound (i) relative to the mass of the photopolymerizable compound (A); and n represents the number of types of the photopolymerizable compounds which are used as the photopolymerizable compound (A) and each of which has only one photopolymerizable group per molecule, and is an integer of 1 or more.
Inventors:
SAKAI NOBUJI (JP)
HIRASAWA TAMANO (JP)
HIRASAWA TAMANO (JP)
Application Number:
PCT/JP2010/056772
Publication Date:
October 20, 2011
Filing Date:
April 15, 2010
Export Citation:
Assignee:
TOYO GOSEI CO LTD (JP)
SAKAI NOBUJI (JP)
HIRASAWA TAMANO (JP)
SAKAI NOBUJI (JP)
HIRASAWA TAMANO (JP)
International Classes:
H01L21/027
Foreign References:
| JP2010000612A | 2010-01-07 | |||
| JP2009274405A | 2009-11-26 | |||
| JP2009275195A | 2009-11-26 | |||
| JP2009208410A | 2009-09-17 | |||
| JP2004059820A | 2004-02-26 | |||
| JP2006310565A | 2006-11-09 | |||
| JP2009227937A | 2009-10-08 |
Attorney, Agent or Firm:
KURIHARA Hiroyuki et al. (JP)
Hiroyuki Kurihara (JP)
Hiroyuki Kurihara (JP)
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Claims:
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