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Title:
PHOTOCURABLE COMPOSITION, PRODUCTION METHOD FOR UNEVEN STRUCTURAL BODY, METHOD FOR FORMING MINUTE UNEVEN PATTERN, AND UNEVEN STRUCTURAL BODY
Document Type and Number:
WIPO Patent Application WO/2021/009980
Kind Code:
A1
Abstract:
This photocurable composition is used in formation of a resin layer of an uneven structural body comprising a substrate and the resin layer which is provided on the substrate and has a minute unevenness in a surface thereof. A cured film of this photocurable composition has a surface free energy of 15-40 mJ/m2 as measured on the basis of the Kitazaki-Hata theory, and a hardness of 0.05-0.5 GPa as measured using a nano-indenter.

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Inventors:
ODA TAKASHI (JP)
OHKITA HISANORI (JP)
WACHI HIROKO (JP)
YAMAMOTO SHINGO (JP)
Application Number:
PCT/JP2020/014775
Publication Date:
January 21, 2021
Filing Date:
March 31, 2020
Export Citation:
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Assignee:
MITSUI CHEMICALS INC (JP)
International Classes:
C08G59/22; B29C59/02; C08G65/18; H01L21/027
Domestic Patent References:
WO2011024421A12011-03-03
WO2010098102A12010-09-02
WO2017006664A12017-01-12
WO2012018043A12012-02-09
WO2012018043A12012-02-09
Foreign References:
JP2012109514A2012-06-07
JP2018141028A2018-09-13
JP5466705B22014-04-09
JP2019129863A2019-08-08
Other References:
See also references of EP 3998298A4
Attorney, Agent or Firm:
HAYAMI Shinji (JP)
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