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Patent Searching and Data


Title:
PHOTOCURABLE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2011/122026
Kind Code:
A1
Abstract:
Disclosed are: a photocurable composition which enables the formation of a highly fine pattern and which enables the formation of a pattern without causing any line defects by undercutting in a bus electrode (4a, 4b) having a white/black two-layered structure; and a bus electrode having a white/black two-layered structure which is produced using the photocurable composition. The photocurable composition is characterized by comprising an inorganic powder, an organic binder, a photopolymerizable monomer, and a photopolymerization initiator which comprises an oxime ester compound having a nitrocarbazole structure and is represented by general formula (I).

Inventors:
USHIYAMA, Kousuke (C/O TAIYO HOLDINGS CO. LTD, Ranzan Facility, 388, Oaza Okura, Ranzanmachi, Hiki-gu, Saitama 22, 〒3550222, JP)
牛山 幸佑 (〒22 埼玉県比企郡嵐山町大字大蔵388番地太陽ホールディングス株式会社 嵐山事業所内 Saitama, 〒3550222, JP)
Application Number:
JP2011/001923
Publication Date:
October 06, 2011
Filing Date:
March 30, 2011
Export Citation:
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Assignee:
TAIYO HOLDINGS CO., LTD. (7-1 Hazawa 2-chome, Nerima-ku Tokyo, 08, 〒1768508, JP)
太陽ホールディングス株式会社 (〒08 東京都練馬区羽沢二丁目7番1号 Tokyo, 〒1768508, JP)
USHIYAMA, Kousuke (C/O TAIYO HOLDINGS CO. LTD, Ranzan Facility, 388, Oaza Okura, Ranzanmachi, Hiki-gu, Saitama 22, 〒3550222, JP)
International Classes:
H01J9/02; C08F2/50; H01J11/02
Attorney, Agent or Firm:
AMAGI INTERNATIONAL PATENT LAW OFFICE (SOLID SQUARE EAST TOWER 4F, 580 Horikawa-cho, Saiwai-ku, Kawasaki-sh, Kanagawa 13, 〒2120013, JP)
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Claims: