Title:
PHOTOCURABLE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2016/104787
Kind Code:
A1
Abstract:
Provided is a dual-curing photocurable composition that utilizes moisture curing and photocuring, wherein said composition: allows sufficient work time to be taken during which curing does not proceed before being irradiated with light; generates a cured product having excellent temporary fixing properties immediately after being irradiated with light; ensures sufficient time for bonding after being irradiated with light, while completely curing comparatively quickly; and does not produce a corrosive acid. The photocurable composition contains: (A) an organic polymer containing a crosslinking silicon group; (B) a photobase generator; (C1) a silicon compound having an Si-F bond; (C2) a fluorine-based compound comprising at least one compound selected from the group consisting of boron trifluoride, a boron trifluoride complex, a fluorinating agent, and an alkali metal salt of a polyvalent fluoro compound; and (D) a polyfunctional compound having more than one (meth)acryloyl group in a molecule.
Inventors:
KONO SHOMA (JP)
KAWAMURA NAOTAKA (JP)
MIDORIKAWA TOMOHIRO (JP)
OKAMURA NAOMI (JP)
YAMAGA HIROSHI (JP)
KAWAMURA NAOTAKA (JP)
MIDORIKAWA TOMOHIRO (JP)
OKAMURA NAOMI (JP)
YAMAGA HIROSHI (JP)
Application Number:
PCT/JP2015/086413
Publication Date:
June 30, 2016
Filing Date:
December 25, 2015
Export Citation:
Assignee:
CEMEDINE CO LTD (JP)
International Classes:
C08F2/44; C09J11/06; C09J133/04; C09J183/12; C09J201/10
Domestic Patent References:
| WO2015056717A1 | 2015-04-23 |
Foreign References:
| JP2015110745A | 2015-06-18 | |||
| JP2015021103A | 2015-02-02 | |||
| JP2013067738A | 2013-04-18 | |||
| JP2014077064A | 2014-05-01 | |||
| JP2013001852A | 2013-01-07 | |||
| JP2007126513A | 2007-05-24 | |||
| JP2004137403A | 2004-05-13 | |||
| JP2010260910A | 2010-11-18 |
Attorney, Agent or Firm:
KON SATOSHI (JP)
Now Tomoji (JP)
Now Tomoji (JP)
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