Title:
PHOTOCURABLE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2022/009640
Kind Code:
A1
Abstract:
The present invention provides a photocurable composition which is capable of forming a cured product that has good reliability in a high temperature constant humidity environment, especially good ion migration resistance in a temperature range of 100°C or higher. A photocurable composition (Z) which is obtained by adding an ion scavenger (Y) to a composition (X) that contains a monofunctional acrylic monomer (A) and a multifunctional acrylic monomer (B), wherein: the content of the monofunctional acrylic monomer (A) relative to 100% by weight of the composition (X) is from 40% by weight to 80% by weight; and the content of the multifunctional acrylic monomer (B) relative to 100% by weight of the composition (X) is from 10% by weight to 50% by weight. An inkjet ink composition which contains this photocurable composition (Z); a cured product; and an electronic component.
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Inventors:
YOHDA MASAAKI (JP)
HIROTA TAKAYUKI (JP)
YOSHITOMI KOHSUKE (JP)
SUGIHARA KATSUYUKI (JP)
OIKAWA HISAO (JP)
HIROTA TAKAYUKI (JP)
YOSHITOMI KOHSUKE (JP)
SUGIHARA KATSUYUKI (JP)
OIKAWA HISAO (JP)
Application Number:
PCT/JP2021/023008
Publication Date:
January 13, 2022
Filing Date:
June 17, 2021
Export Citation:
Assignee:
JNC CORP (JP)
International Classes:
C08F220/10; B41J2/01; B41M5/00; C08F2/44; C08F2/48; C09D11/30
Domestic Patent References:
| WO2013015125A1 | 2013-01-31 | |||
| WO2021090872A1 | 2021-05-14 |
Foreign References:
| JP2005317523A | 2005-11-10 | |||
| JP2003238770A | 2003-08-27 | |||
| JP2002302536A | 2002-10-18 | |||
| JPH05327191A | 1993-12-10 | |||
| JP2019119818A | 2019-07-22 | |||
| JP2007191511A | 2007-08-02 | |||
| JP2015127802A | 2015-07-09 |
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