PHOTOCURABLE RESIN COMPOSITION FOR IMPRINTING, METHOD FOR PRODUCING SAME, AND STRUCTURE

Title:

PHOTOCURABLE RESIN COMPOSITION FOR IMPRINTING, METHOD FOR PRODUCING SAME, AND STRUCTURE

Document Type and Number:

WIPO Patent Application WO/2013/176020

Kind Code:

A1

Abstract:

[Problem] To provide a photocurable resin composition in which curing shrinkage during optical imprinting is suppressed. Also to provide a photocurable resin composition capable of producing, by optical imprinting, a structure which has a high surface hardness and in which occurrence of yellowing is suppressed even when subjected to irradiation with ultraviolet radiation and the like. [Solution] This photocurable resin composition for imprinting contains a (meth)acrylic monomer (A) and a photoinitiator (B), and is characterized in that the photoinitiator (B) comprises a combination of an alkylphenone-based photoinitiator (B1) and an acylphosphine oxide-based photoinitiator (B2), and the blending ratio of the alkylphenone-based photoinitiator (B1) and the acylphosphine oxide-based photoinitiator (B2) (B1:B2) is between 1:99 and 90:10 by weight.

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Inventors:

YAMADA HIROKO (JP)
SUTO YASUO (JP)
MIYAZAWA YUKIHIRO (JP)

Application Number:

PCT/JP2013/063566

Publication Date:

November 28, 2013

Filing Date:

May 15, 2013

Export Citation:

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Assignee:

SOKEN KAGAKU KK (JP)

International Classes:

B81C99/00; H01L21/027; C08F2/50

Domestic Patent References:

WO2009069557A1	2009-06-04
WO2011155499A1	2011-12-15
WO2012014961A1	2012-02-02

Foreign References:

JP2012214716A	2012-11-08
JP2011207221A	2011-10-20

Other References: