Title:
PHOTOCURABLE RESIN COMPOSITION FOR MICROLENSES
Document Type and Number:
WIPO Patent Application WO/2017/077932
Kind Code:
A1
Abstract:
A microlens having high refractive index and low Abbe number is able to be produced by an optical nanoimprint method with use of, for example, a photocurable resin composition for microlenses, which contains a triazine ring-containing polymer comprising a repeating unit structure represented by formula (3) and having a weight average molecular weight of 500-5,000 and a reactive diluent such as N-vinyl formamide, and which does not contain a solvent.
Inventors:
MAEDA DAISUKE (JP)
NISHIMURA NAOYA (JP)
NISHIMURA NAOYA (JP)
Application Number:
PCT/JP2016/081829
Publication Date:
May 11, 2017
Filing Date:
October 27, 2016
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
G02B1/04; C08F2/44; C08F2/48; C08L79/00; G02B3/00
Domestic Patent References:
| WO2013168787A1 | 2013-11-14 | |||
| WO2014136871A1 | 2014-09-12 | |||
| WO2012111682A1 | 2012-08-23 |
Foreign References:
| JP2009012319A | 2009-01-22 |
Attorney, Agent or Firm:
PATENT PROFESSIONAL CORPORATION EI-MEI PATENT OFFICE (JP)
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