PHOTOCURING 3D PRINTING DEVICE AND IMAGE EXPOSURE SYSTEM THEREOF

Title:

PHOTOCURING 3D PRINTING DEVICE AND IMAGE EXPOSURE SYSTEM THEREOF

Document Type and Number:

WIPO Patent Application WO/2020/125570

Kind Code:

A1

Abstract:

An image exposure system for a 3D printing device, which uses a silicon-based liquid crystal panel (203) as an array image source. The silicon-based liquid crystal panel (203) comprises a lens electrode array (302), a common electrode (304), a liquid crystal (305) located between the lens electrode array (302) and the common electrode (304), a first alignment film (303) located between the lens electrode array (302) and the liquid crystal (305), and a second alignment film (306) located between the liquid crystal (305) and the common electrode (304). The first alignment film (303) protrudes at each lens electrode (E) corresponding to the lens electrode array (302) to form focusing lenses. Each focusing lens is capable of converging the light irradiated to the corresponding lens electrode (E) so that the size (s) of a micro spot reflected by the lens electrode (E) is less than the size of a pixel corresponding to the lens electrode (E). The silicon-based liquid crystal panel (203) is used for adjusting the state of the liquid crystal (305) according to a control signal so as to change the polarization direction of each light reflected by the lens electrode array (302).

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Inventors:

HOU FENG (CN)

Application Number:

PCT/CN2019/125538

Publication Date:

June 25, 2020

Filing Date:

December 16, 2019

Export Citation:

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Assignee:

PRISMLAB CHINA LTD (CN)

International Classes:

B29C64/129; B29C64/20; B29C64/264; G03F7/22

Foreign References:

CN209224557U	2019-08-09
CN104802400A	2015-07-29
CN207965473U	2018-10-12
CN101010605A	2007-08-01
CN105690754A	2016-06-22
CN102566325A	2012-07-11
JP2004133127A	2004-04-30
JPH11258585A	1999-09-24

Attorney, Agent or Firm:

SHANGHAI PATENT & TRADEMARK LAW OFFICE, LLC (CN)

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