Title:
PHOTOCURING 4D PRINTING METHOD FOR MULTILAYER STRUCTURE HAVING ADJUSTABLE SHAPE RECOVERY SPEED, AND MULTILAYER STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2023/236490
Kind Code:
A1
Abstract:
Provided are a photocuring 4D printing method for a multilayer structure having an adjustable shape recovery speed, and a multilayer structure. The multilayer structure printed by the photocuring 4D printing method for a multilayer structure having an adjustable shape recovery speed comprises a plurality of deformation units; the plurality of deformation units are sequentially connected in series, and each of the deformation units comprises slow layers, a fast layer (3), and a transition layer (2); the fast layer (3) is disposed between two slow layers, and the transition layer (2) is disposed between at least one slow layer and the fast layer (3). A low cross-linked layer is doped with a carbon nano light-absorbing material, such that the problem that the low cross-linked layer is prone to over-curing by printing a high cross-linked layer to the low cross-linked layer is solved.
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Inventors:
HUANG SHU (CN)
ZHANG HANG (CN)
ZHOU JIANZHONG (CN)
SHENG JIE (CN)
WEI JIEAN (CN)
YANG HONGWEI (CN)
WANG CHENG (CN)
SHAN MINGYUAN (CN)
ZHANG HANG (CN)
ZHOU JIANZHONG (CN)
SHENG JIE (CN)
WEI JIEAN (CN)
YANG HONGWEI (CN)
WANG CHENG (CN)
SHAN MINGYUAN (CN)
Application Number:
PCT/CN2022/139478
Publication Date:
December 14, 2023
Filing Date:
December 16, 2022
Export Citation:
Assignee:
UNIV JIANGSU (CN)
International Classes:
B29C64/393; B32B33/00; B33Y10/00; B33Y50/02; B33Y80/00
Domestic Patent References:
WO2022088219A1 | 2022-05-05 |
Foreign References:
CN113561490A | 2021-10-29 | |||
CN112848268A | 2021-05-28 | |||
CN115071126A | 2022-09-20 | |||
CN109664499A | 2019-04-23 | |||
US10906238B1 | 2021-02-02 | |||
CN112409774A | 2021-02-26 |
Attorney, Agent or Firm:
NANJING DOYES INTELLECTUAL PROPERTY CO., LTD. (CN)
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