Title:
PHOTOELECTRIC SENSOR AND MANUFACTURING METHOD THEREFOR, AND DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/214799
Kind Code:
A1
Abstract:
Provided are a photoelectric sensor and a manufacturing method therefor, and a display device. The manufacturing method for the photoelectric sensor comprises: manufacturing a thin-film transistor array and a photodiode array on a silicon substrate; transferring the thin-film transistor array onto a substrate base plate by means of a micro-transfer process; and placing the photodiode array on the substrate base plate where the thin-film transistor array is formed in such a manner that an orthographic projection of the photodiode array on the substrate base plate and an orthographic projection of the thin-film transistor array on the substrate base plate have an overlapping region.
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Inventors:
GUO YUZHEN (CN)
DONG XUE (CN)
WANG HAISHENG (CN)
WU CHUNWEI (CN)
LIU YINGMING (CN)
XU RUI (CN)
DONG XUE (CN)
WANG HAISHENG (CN)
WU CHUNWEI (CN)
LIU YINGMING (CN)
XU RUI (CN)
Application Number:
PCT/CN2018/087253
Publication Date:
November 29, 2018
Filing Date:
May 17, 2018
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
International Classes:
H01L27/12; H01L27/146
Foreign References:
CN107248518A | 2017-10-13 | |||
CN102790061A | 2012-11-21 | |||
CN101427387A | 2009-05-06 | |||
KR20090046179A | 2009-05-11 | |||
KR20110134226A | 2011-12-14 |
Other References:
See also references of EP 3633726A4
Attorney, Agent or Firm:
DRAGON INTELLECTUAL PROPERTY LAW FIRM (CN)
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