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Title:
PHOTOETCHING APPARATUS AND METHOD
Document Type and Number:
WIPO Patent Application WO/2018/166444
Kind Code:
A1
Abstract:
Disclosed are a photoetching apparatus and method. The photoetching apparatus comprises at least two sets of exposure apparatus and one set of substrate apparatus, wherein the substrate apparatus comprises a substrate table (10) and a substrate (7), wherein the substrate table (10) carries the substrate (7); and the at least two sets of exposure apparatus are symmetrically distributed, in the direction of exposure scanning, above the substrate (7), and form two exposure fields on the substrate (7) to expose the substrate (7) in the exposure fields.

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Inventors:
ZHOU CHANG (CN)
YANG ZHIYONG (CN)
MA LINLIN (CN)
Application Number:
PCT/CN2018/078829
Publication Date:
September 20, 2018
Filing Date:
March 13, 2018
Export Citation:
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Assignee:
SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD (CN)
International Classes:
G03F7/20; G03F9/00
Foreign References:
CN104136969A2014-11-05
CN103197506A2013-07-10
CN101303533A2008-11-12
CN105320399A2016-02-10
CN104412152A2015-03-11
JP2005092137A2005-04-07
Attorney, Agent or Firm:
SHANGHAI SAVVY INTELLECTUAL PROPERTY AGENCY (CN)
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