Title:
PHOTOFUNCTIONAL MATERIALS
Document Type and Number:
WIPO Patent Application WO/2004/063283
Kind Code:
A1
Abstract:
Photofunctional materials having vinylphosphonic acid groups, preferably photofunctional materials having chemical structures represented by the general formula (1): (1) (wherein X is a monovalent organic residue; R1 and R2 are each independently hydrogen or a monovalent organic residue; M1 and M2 are each independently hydrogen, substituted or unsubstituted alkyl, substituted or unsubstituted aryl, substituted or unsubstituted silyl, or a cation; R1 and R2, R1 and X, or R2 and X may be united to form a ring; and X and R2 may be replaced with each other). The photofunctional materials are favorably usable as sensitizing dyes for dye-sensitized photoelectric conversion cells and can attain high photoelectric conversion efficiency and strong adsorption to the interface of an inorganic semiconductor.
Inventors:
YAGI TADAO (JP)
ANDO MOTONORI (JP)
KURATA RYUICHIRO (JP)
ANDO MOTONORI (JP)
KURATA RYUICHIRO (JP)
Application Number:
PCT/JP2004/000267
Publication Date:
July 29, 2004
Filing Date:
January 16, 2004
Export Citation:
Assignee:
TOYO INK MFG CO (JP)
YAGI TADAO (JP)
ANDO MOTONORI (JP)
KURATA RYUICHIRO (JP)
YAGI TADAO (JP)
ANDO MOTONORI (JP)
KURATA RYUICHIRO (JP)
International Classes:
C07F9/38; C07F9/40; C07F9/553; C07F9/572; C07F9/60; C07F9/64; C07F9/6503; C07F9/6509; C07F9/6512; C07F9/653; C07F9/6533; C07F9/6541; C07F9/6547; C07F9/655; C07F9/6553; C07F9/6558; C07F9/6561; C09B23/10; H01M14/00; (IPC1-7): C09B23/10; C07F9/38; H01L31/04; H01M14/00
Foreign References:
| EP1176618A1 | 2002-01-30 | |||
| EP0911841A2 | 1999-04-28 |
Attorney, Agent or Firm:
Miyoshi, Hidekazu (2-8 Toranomon 1-chom, Minato-ku Tokyo, JP)
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