PHOTOLITHOGRAPHY DEVICE, GAS BATH APPARATUS AND GAS BATH GENERATOR THEREOF

WIPO Patent Application WO/2023/138251

A1

The present invention provides a photolithography device, a gas bath apparatus and a gas bath generator thereof. The gas bath generator comprises a closed annular body. The closed annular body is arranged around a working area. An annular flow channel is formed in the closed annular body. The closed annular body is further provided with circumferentially distributed gas outlets in communication with the annular flow channel. By means of the gas outlets, a closed airflow layer distributed around the working area is generated. The gas bath generator provided by the present invention can be used for a photolithography device and circumferentially arranged around an exposure area of the photolithography device to form a closed airflow layer isolating the exposure area from the outside around the periphery of the exposure area. The present invention solves the problem of how to reduce gas contamination and particle contamination in the silicon wafer microenvironment located in the exposure area of the photolithography device.

WANG KUIBO (CN)
WU XIAOBIN (CN)
HAN XIAOQUAN (CN)
LUO YAN (CN)
SHA PENGFEI (CN)
LI HUI (CN)
SUN JIAZHENG (CN)
XIE WANLU (CN)
MA HE (CN)
TAN FANGRUI (CN)

PCT/CN2022/137428

July 27, 2023

December 08, 2022

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INST OF MICROELECTRONICS CAS (CN)

G03F7/20

CN114460814A	2022-05-10
CN115390365A	2022-11-25
CN107664263A	2018-02-06
CN112255886A	2021-01-22
CN110554570A	2019-12-10
JPH0986331A	1997-03-31
EP0143154A1	1985-06-05
CN110764368A	2020-02-07
CN102841508A	2012-12-26

BEIJING CHEN QUAN INTELLECTUAL PROPERTY LAW FIRM (CN)

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