Title:
PHOTOLITHOGRAPHY MASK, MANUFACTURING METHOD THEREOF, AND PHOTOLITHOGRAPHY METHOD
Document Type and Number:
WIPO Patent Application WO/2017/197915
Kind Code:
A1
Abstract:
A photolithography mask, manufacturing method thereof, and photolithography method employing the photolithography mask. The photolithography mask comprises a substrate (3), a mask pattern arranged on a surface of the substrate (3), and a conductive connection pattern (2) arranged on the surface, wherein the conductive connection pattern (2) is used to electrically connect separate portions (1a, 1b, 1c, 1d) of the mask pattern together.
Inventors:
LV ZHENHUA (CN)
CHEN XI (CN)
WANG SHIJUN (CN)
BAO ZHIYING (CN)
ZHANG YONG (CN)
LI YUE (CN)
XIAO WENJUN (CN)
XUE YANNA (CN)
JIANG WENBO (CN)
CHEN XI (CN)
WANG SHIJUN (CN)
BAO ZHIYING (CN)
ZHANG YONG (CN)
LI YUE (CN)
XIAO WENJUN (CN)
XUE YANNA (CN)
JIANG WENBO (CN)
Application Number:
PCT/CN2017/070816
Publication Date:
November 23, 2017
Filing Date:
January 11, 2017
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
BEIJING BOE OPTOELECTRONICS TECH CO LTD (CN)
BEIJING BOE OPTOELECTRONICS TECH CO LTD (CN)
International Classes:
G03F1/40
Foreign References:
| CN105759562A | 2016-07-13 | |||
| CN103941540A | 2014-07-23 | |||
| CN203759422U | 2014-08-06 | |||
| CN204374607U | 2015-06-03 | |||
| CN203164592U | 2013-08-28 | |||
| TW200625000A | 2006-07-16 | |||
| KR20130044393A | 2013-05-03 |
Attorney, Agent or Firm:
CHINA PATENT AGENT (H.K.) LTD. (CN)
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