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Title:
PHOTOLITHOGRAPHY PROJECTION OBJECTIVE LENS AND PHOTOLITHOGRAPHY MACHINE
Document Type and Number:
WIPO Patent Application WO/2023/198096
Kind Code:
A1
Abstract:
A photolithography projection objective lens (50), comprising: a first lens group (G1), a second lens group (G2), a third lens group (G3), a fourth lens group (G4) and a fifth lens group (G5), which are sequentially arranged along an optical axis, wherein the focal power φ1 of the first lens group (G1), the focal power φ2 of the second lens group (G2), the focal power φ3 of the third lens group (G3), the focal power φ4 of the fourth lens group (G4), and the focal power φ5 of the fifth lens group (G5) satisfy the following formulas (I) and (II). On the basis of a high exposure resolution being realized, the number of lenses and the number of aspheric lenses can be reduced, such that the design costs and the manufacturing period of the photolithography projection objective lens (50) are reduced, thereby improving the market competitiveness of the product; moreover, by means of combining positive focal power and negative focal powers which alternate with each other, the image quality correction capability of the photolithography projection objective lens (50) is improved, such that the exposure imaging quality is improved, thereby realizing a lower exposure resolution and CDU. The photolithography projection objective lens (50) is applied to a photolithography machine.

Inventors:
HOU BAOLU (CN)
WANG JINXIA (CN)
WANG CAIHONG (CN)
WANG YANFEI (CN)
WANG FENG (CN)
LI YUNFENG (CN)
Application Number:
PCT/CN2023/087746
Publication Date:
October 19, 2023
Filing Date:
April 12, 2023
Export Citation:
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Assignee:
SHANGHAI MICRO ELECTRONICS EQUIPMENT GROUP CO LTD (CN)
International Classes:
G02B13/00
Foreign References:
CN109581622A2019-04-05
CN103364928A2013-10-23
CN102540416A2012-07-04
CN102331616A2012-01-25
JP2000056218A2000-02-25
CN111381346A2020-07-07
CN103713379A2014-04-09
Attorney, Agent or Firm:
SHANGHAI SAVVY IP AGENCY CO., LTD. (CN)
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