Title:
PHOTOMASK BLANK AND PHOTOMASK, AND THEIR MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2007/099910
Kind Code:
A1
Abstract:
Provided are a photomask blank and a photomask, which can form a pattern of a shading
film having an excellent sectional shape by optimizing the wet etching characteristics
of the shading film, and which can form a pattern of a shading film having extremely
small jaggies. The photomask blank having the shading film on a transparent
substrate is provided for a wet etching treatment exemplifying a mask by a mask
pattern formed on the shading film. This wet etching treatment matches a photomask
manufacturing method for patterning the shading film. This shading film is
made of a material containing chromium, and has a crystal size of 10 nm or less,
as calculated from a diffraction peak of CrN(200) by an X-ray diffraction. The
shading film is patterned by the wet etching treatment, to produce a photomask
having the shading film pattern on the substrate.
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Inventors:
YAMADA TAKEYUKI (JP)
MITSUI MASARU (JP)
MITSUI MASARU (JP)
Application Number:
PCT/JP2007/053528
Publication Date:
September 07, 2007
Filing Date:
February 26, 2007
Export Citation:
Assignee:
HOYA CORP (JP)
YAMADA TAKEYUKI (JP)
MITSUI MASARU (JP)
YAMADA TAKEYUKI (JP)
MITSUI MASARU (JP)
International Classes:
C23C14/06; G03F1/54; G03F1/80; H01L21/027
Foreign References:
| JPH02212841A | 1990-08-24 | |||
| JP3276954B2 | 2002-04-22 | |||
| JPH10163105A | 1998-06-19 | |||
| JPH05297570A | 1993-11-12 | |||
| JPH11172426A | 1999-06-29 | |||
| JPH07118829A | 1995-05-09 |
Attorney, Agent or Firm:
OTSUKA, Takefumi (Ginza Chuo Bldg. 1-20, Tsukiji 4-chom, Chuo-ku Tokyo 45, JP)
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