Title:
PHOTOMASK AND METHOD FOR FABRICATING ACTIVE SWITCH ARRAY SUBSTRATE THEREOF
Document Type and Number:
WIPO Patent Application WO/2018/176603
Kind Code:
A1
Abstract:
A photomask and a method for fabricating an active switch array substrate thereof, the photomask (201) comprising: a light transmitting region (220); a light shielding region (230); and a light semi-transmitting region (210, 212) which is arranged between the light transmitting region and the light shielding region, wherein the light transmittance of the photomask is regulated by permeation and distribution density of a low-reflection material, so that the light transmittance of the light semi-transmitting region is lower than that of the light transmitting region and higher than that of the light shielding region.
Inventors:
CHEN YU-JEN (CN)
Application Number:
PCT/CN2017/084669
Publication Date:
October 04, 2018
Filing Date:
May 17, 2017
Export Citation:
Assignee:
HKC CORP LTD (CN)
CHONGQING HKC OPTOELECTRONICS TECH CO LTD (CN)
CHONGQING HKC OPTOELECTRONICS TECH CO LTD (CN)
International Classes:
G03F1/52; G02F1/1335; G03F1/00
Foreign References:
| CN101344720A | 2009-01-14 | |||
| CN106526953A | 2017-03-22 | |||
| CN104409416A | 2015-03-11 |
Attorney, Agent or Firm:
BEIJING HUIZE INTELLECTUAL PROPERTY LAW LLC (CN)
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