Title:
PHOTOMASK, METHOD FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING COLOR FILTER USING PHOTOMASK
Document Type and Number:
WIPO Patent Application WO/2018/016485
Kind Code:
A1
Abstract:
Provided is a photomask used in scanning type projection exposure provided with a projection lens formed from multiple lenses, wherein the line width for a plurality of patterns (Cnn) for the photomask present in a region (SA2) transferred by scanning exposure including the connecting part (36a) of the multiple lenses is a corrected line width for the pattern line width of the same shape as the pattern (Cnn) for the photomask present in a region (SA1) transferred by scanning exposure not including the connecting part (36a).
Inventors:
OKUMURA AKIHITO (JP)
MIYAJI HIROAKI (JP)
YAMADA TAKEHIRO (JP)
MIYAJI HIROAKI (JP)
YAMADA TAKEHIRO (JP)
Application Number:
PCT/JP2017/025967
Publication Date:
January 25, 2018
Filing Date:
July 18, 2017
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD (JP)
International Classes:
G03F1/70; G02B5/20; G03F7/20
Foreign References:
| JP2008185908A | 2008-08-14 | |||
| JP2009251013A | 2009-10-29 | |||
| JP2011187869A | 2011-09-22 | |||
| JP2000100688A | 2000-04-07 | |||
| JP2009259992A | 2009-11-05 | |||
| JP2001060546A | 2001-03-06 | |||
| US20050142458A1 | 2005-06-30 |
Attorney, Agent or Firm:
MATSUNUMA Yasushi et al. (JP)
Download PDF: