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Title:
PHOTOMASK AND PATTERN FORMING METHOD USING SAME
Document Type and Number:
WIPO Patent Application WO/2014/111983
Kind Code:
A1
Abstract:
A photomask includes a transparent substrate and a light-shielding section provided on the transparent substrate. The light-shielding section has a translucent mask pattern opening, and in the mask pattern opening, there are provided a plurality of translucent areas that transmit light to peripheries of areas corresponding to a desired pattern, in at least three different phases with respect to exposure light. In order that exposure light having passed through the mask pattern opening should form a projected image in a desired pattern on an exposed body positioned at a predetermined distance, the translucent areas are configured as follows: a phase plane of the exposure light that has passed through a translucent area far from the areas corresponding to the desired pattern, among the translucent areas, progresses with respect to the exposed body, as compared with a phase plane of exposure light that has passed through a translucent area close to the areas corresponding to the desired pattern.

Inventors:
MISAKA AKIO
Application Number:
PCT/JP2013/005834
Publication Date:
July 24, 2014
Filing Date:
October 01, 2013
Export Citation:
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Assignee:
PANASONIC CORP (JP)
International Classes:
G03F1/28; G03F1/70; G03F7/20; H01L21/027
Domestic Patent References:
WO2013145044A12013-10-03
Foreign References:
JP2001358073A2001-12-26
JP2005345920A2005-12-15
JP2001356469A2001-12-26
JP2009230126A2009-10-08
JP2012032783A2012-02-16
JPH07253650A1995-10-03
JP2009258250A2009-11-05
JP2007013088A2007-01-18
Attorney, Agent or Firm:
NAITO, Hiroki et al. (JP)
Hiroki Naito (JP)
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