Title:
PHOTOMASK AND PREPARATION METHOD FOR COLOR FILM SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2017/004905
Kind Code:
A1
Abstract:
A photomask (1) and a preparation method for a color film substrate, which relate to the technical field of display, and are capable of simplifying a preparation process of a color film substrate and improving the production efficiency of the color film substrate. The photomask (1) comprises: a first part (11) having a first light transmittance, a second part (12) having a second light transmittance, and a third part (13) having a third light transmittance. The first part (11) corresponds to a flat layer (3) of the color film substrate, the second part (12) corresponds to an auxiliary spacer (4) of the color film substrate, and the third part (13) corresponds to a master spacer (5) of the color film substrate.
Inventors:
ZHAO CHUANG (CN)
Application Number:
PCT/CN2015/091891
Publication Date:
January 12, 2017
Filing Date:
October 14, 2015
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
G02F1/1333; G02F1/1339; G02F1/1335; G03F7/00
Foreign References:
| CN103529591A | 2014-01-22 | |||
| CN1726427A | 2006-01-25 | |||
| CN102213857A | 2011-10-12 | |||
| CN104932138A | 2015-09-23 | |||
| CN104155843A | 2014-11-19 | |||
| CN104698739A | 2015-06-10 | |||
| EP1666957A1 | 2006-06-07 |
Attorney, Agent or Firm:
YUHONG INTELLECTUAL PROPERTY LAW FIRM (CN)
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