Title:
PHOTOPOLYMER COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2020/153638
Kind Code:
A1
Abstract:
The present invention relates to: a photopolymer composition for forming a hologram, comprising a polymer matrix having a glass transition temperature of 80°C or lower or a precursor thereof, a photoreactive monomer, a low-refractive-index fluorine-based compound and a photoinitiator; a hologram recording medium manufactured from the photopolymer composition; an optical device comprising the hologram recording medium; and a hologram recording method using the hologram recording medium.
Inventors:
JANG SEOKHOON (KR)
KIM HEON (KR)
KWON SE HYUN (KR)
CHANG YEONGRAE (KR)
KIM HEON (KR)
KWON SE HYUN (KR)
CHANG YEONGRAE (KR)
Application Number:
PCT/KR2020/000496
Publication Date:
July 30, 2020
Filing Date:
January 10, 2020
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
International Classes:
C08F2/50; C08F2/44; C08F263/04; C08K5/02; C08K5/521; C08L31/04; G11B7/08; G11B7/2533
Foreign References:
| KR20120107086A | 2012-09-28 | |||
| KR100127859B1 | ||||
| JP2004191919A | 2004-07-08 | |||
| JPH05273899A | 1993-10-22 | |||
| KR20180119394A | 2018-11-02 |
Attorney, Agent or Firm:
YOU ME PATENT AND LAW FIRM (KR)
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