Title:
PHOTOPOLYMERIZABLE COMPOSITION FOR FORMING BEZEL PATTERN, METHOD FOR FORMING BEZEL PATTERN USING SAME, AND BEZEL PATTERN MANUFACTURED THEREBY
Document Type and Number:
WIPO Patent Application WO/2019/132486
Kind Code:
A1
Abstract:
The present invention relates to a photopolymerizable composition for forming a bezel pattern developed to be applied on a display substrate, a method for forming a bezel pattern using the same, a bezel pattern manufactured thereby, a display substrate comprising a bezel pattern manufactured thereby, and a rework method for removing a bezel pattern having a defective printed pattern. The composition includes specific components in a specific content range and thus is suitable for manufacturing a bezel pattern that is easily removed, has sufficient adhesion to a display substrate, and good curing sensitivity and pencil hardness, without requiring a high-temperature heating process.
Inventors:
PARK SUNGEUN (KR)
YOO JAEHYUN (KR)
KIM AREUM (KR)
KIM JOONHYUNG (KR)
YOO JAEHYUN (KR)
KIM AREUM (KR)
KIM JOONHYUNG (KR)
Application Number:
PCT/KR2018/016610
Publication Date:
July 04, 2019
Filing Date:
December 26, 2018
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
International Classes:
C09D11/101; C09D9/00; C09D11/324; C09D11/36; C09D11/38; G03F7/20
Foreign References:
| KR101782217B1 | 2017-09-26 | |||
| KR20070012386A | 2007-01-25 | |||
| JP2012256726A | 2012-12-27 | |||
| JP2009021595A | 2009-01-29 | |||
| JP2006299148A | 2006-11-02 |
Attorney, Agent or Firm:
KIM, Aera (KR)
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