PHOTOPOLYMERIZABLE RESIN COMPOSITION FOR USE IN TRANSFERRING MICROSTRUCTURE

WIPO Patent Application WO/2012/014961

A1

This photopolymerizable resin composition for use in transferring a microstructure is characterized by containing the following components (A), (B), (C), (D), and (C) in the following ratio: (A) 6- to 15-functional acrylate, 0.5 to 10 mass%; (B) acrylate with the weight-average molecular weight (Mw) of 1000 to 10000, 0.5 to 10 mass%; (C) acrylate having a benzene ring, 0.5 to 10 mass%; (D) a reactive diluent, 80 to 98 mass%; and (E) a photopolymerization initiator, 0.1 to 5 mass%.

WASHIYA Ryuta (HITACHI LTD., 1-1, Omika-cho 7-chome, Hitachi-sh, Ibaraki 92, 〒3191292, JP)
鷲谷　隆太 (〒92 茨城県日立市大みか町七丁目１番１号　株式会社日立製作所　日立研究所内 Ibaraki, 〒3191292, JP)
OGINO Masahiko (HITACHI LTD., 1-1, Omika-cho 7-chome, Hitachi-sh, Ibaraki 92, 〒3191292, JP)
荻野　雅彦 (〒92 茨城県日立市大みか町七丁目１番１号　株式会社日立製作所　日立研究所内 Ibaraki, 〒3191292, JP)
SHIZAWA Noritake (1600 Kami, Kamisato-machi, Kodama-gu, Saitama 95, 〒3690395, JP)

JP2011/067217

February 02, 2012

July 28, 2011

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HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目２４番１４号 Tokyo, 〒1058717, JP)
WASHIYA Ryuta (HITACHI LTD., 1-1, Omika-cho 7-chome, Hitachi-sh, Ibaraki 92, 〒3191292, JP)
鷲谷　隆太 (〒92 茨城県日立市大みか町七丁目１番１号　株式会社日立製作所　日立研究所内 Ibaraki, 〒3191292, JP)
OGINO Masahiko (HITACHI LTD., 1-1, Omika-cho 7-chome, Hitachi-sh, Ibaraki 92, 〒3191292, JP)
荻野　雅彦 (〒92 茨城県日立市大みか町七丁目１番１号　株式会社日立製作所　日立研究所内 Ibaraki, 〒3191292, JP)

C08F290/06; G11B5/84; H01L21/027

ISONO Michizo (Sabo Kaikan Annex 7-4, Hirakawa-cho 2-chome, Chiyoda-k, Tokyo 93, 〒1020093, JP)

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