Title:
PHOTOPOLYMERIZATION INITIATOR, PHOTOSENSITIVE COMPOSITION, AND CURED ARTICLE
Document Type and Number:
WIPO Patent Application WO/2013/008652
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a photopolymerization initiator having high sensitivity and excellent solubility; a photosensitive composition containing the photopolymerization initiator; and a cured article produced by curing the photosensitive composition.
A photopolymerization initiator characterized in that a group having an oxime ester bond is bound to an indole skeleton that may have a substituent and the indole skeleton is substituted by at least one nitro group; a photosensitive composition comprising a polymerizable compound having an olefin bond and the photopolymerization initiator; and a cured article produced by curing the photosensitive composition.
Inventors:
YAMADA HIROAKI (JP)
Application Number:
PCT/JP2012/066763
Publication Date:
January 17, 2013
Filing Date:
June 29, 2012
Export Citation:
Assignee:
NIPPON STEEL & SUMIKIN CHEM CO (JP)
YAMADA HIROAKI (JP)
YAMADA HIROAKI (JP)
International Classes:
C08F2/50; G03F7/004; G03F7/031; C07D209/14
Domestic Patent References:
| WO2009081483A1 | 2009-07-02 |
Foreign References:
| JP2006516246A | 2006-06-29 | |||
| JP2005128483A | 2005-05-19 |
Attorney, Agent or Firm:
SASAKI Kazuya et al. (JP)
Kazuya Sasaki (JP)
Kazuya Sasaki (JP)
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