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Title:
PHOTORESIST COMPOSITION, COMPOUND AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2013/140969
Kind Code:
A1
Abstract:
The present invention is a photoresist composition which contains [A] a polymer that has a structural unit (I) containing an acid-cleavable group and a compound (I) that is represented by formula (1). In formula (1), each of R1, R2, R3 and R represents a hydrogen atom or a monovalent organic group having 1-20 carbon atoms; X represents a single bond, an oxygen atom or -NRa- (wherein Ra represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1-20 carbon atoms, and may combine with the above-described R to form a ring structure); A- represents -SO3 - or -CO2 -; and M+ represents a monovalent onium cation.

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Inventors:
NAMAI HAYATO (JP)
IKEDA NORIHIKO (JP)
KAWAKAMI TAKANORI (JP)
Application Number:
PCT/JP2013/055258
Publication Date:
September 26, 2013
Filing Date:
February 27, 2013
Export Citation:
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Assignee:
JSR CORP (JP)
International Classes:
C07C309/17; C07C381/12; C07D207/416; C07D211/46; C07D237/04; C07D237/16; C07D295/18; C07D307/33; C07D307/64; C07D307/93; C07D307/94; C07D311/74; C07D313/06; C07D317/24; C07D319/06; C07D321/12; C07D327/04; C07D493/10; C09K3/00; G03F7/004; G03F7/039
Domestic Patent References:
WO2011030737A12011-03-17
Foreign References:
JPH1010715A1998-01-16
Attorney, Agent or Firm:
AMANO KAZUNORI (JP)
Kazuki Amano (JP)
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