Title:
PHOTORESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2012/111450
Kind Code:
A1
Abstract:
The present invention is a photoresist composition to be developed with an organic solvent, which is characterized by comprising [A] a polymer having an acid-labile group, [B] an acid generator, and [C] a compound having both at least one group selected from a hydroxyl group, a carboxyl group, a group that can be converted into a carboxyl group by the action of an acid and a group having a lactone structure and a ring structure and having a molecular weight of 1,000 or less. The ring structure in the compound [C] is preferably a polycyclic alicyclic structure. The compound [C] is preferably at least one compound selected from the group consisting of compounds respectively represented by formulae (1)-(3).
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Inventors:
SAKAKIBARA HIROKAZU (JP)
FURUKAWA TAIICHI (JP)
MIYATA HIROMU (JP)
ITO KOJI (JP)
FURUKAWA TAIICHI (JP)
MIYATA HIROMU (JP)
ITO KOJI (JP)
Application Number:
PCT/JP2012/052431
Publication Date:
August 23, 2012
Filing Date:
February 02, 2012
Export Citation:
Assignee:
JSR CORP (JP)
SAKAKIBARA HIROKAZU (JP)
FURUKAWA TAIICHI (JP)
MIYATA HIROMU (JP)
ITO KOJI (JP)
SAKAKIBARA HIROKAZU (JP)
FURUKAWA TAIICHI (JP)
MIYATA HIROMU (JP)
ITO KOJI (JP)
International Classes:
G03F7/039; G03F7/004; G03F7/038; G03F7/32; H01L21/027
Foreign References:
| JP2008310314A | 2008-12-25 | |||
| JP2003241376A | 2003-08-27 | |||
| JP2002049157A | 2002-02-15 | |||
| JP2001215709A | 2001-08-10 | |||
| JP2011248019A | 2011-12-08 |
Attorney, Agent or Firm:
AMANO KAZUNORI (JP)
Kazuki Amano (JP)
Kazuki Amano (JP)
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Claims: