PHOTORESIST COMPOSITIONS COMPRISING ACETALS AND KETALS AS SOLVENTS

WIPO Patent Application WO2003085455

A3

Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.

WANAT STANLEY F
PLASS ROBERT R
OBERLANDER JOSEPH E
MCKENZIE DOUGLAS

PCT/EP2003/003255

May 21, 2004

March 28, 2003

Click for automatic bibliography generation  

CLARIANT INT LTD (CH)

G03F7/004; G03F7/022; G03F7/023; G03F7/038; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; G03F7/023; G03F7/039

WO2003005125A1

2003-01-16

EP0273026A2	1988-06-29
US6238831B1	2001-05-29
US5204216A	1993-04-20
EP0520654A1	1992-12-30
EP0372408A2	1990-06-13
EP0284868A2	1988-10-05

DATABASE WPI Section Ch Week 199704, Derwent World Patents Index; Class A89, AN 1997-039480, XP002273251

View/Download PDF      PDF Help

Previous Patent: TECHNIQUE FOR WRITING WITH A RASTER SCANNED BEAM

Next Patent: METHOD AND DEVICE FOR IMAGING A MASK ONTO A SUBSTRATE