Title:
PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS
Document Type and Number:
WIPO Patent Application WO1999014256
Kind Code:
A8
Abstract:
The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
Inventors:
RHODES LARRY F
BELL ANDREW
JAYARAMAN SAIKUMAR
LIPIAN JOHN-HENRY
GOODALL BRIAN L
SHICK ROBERT A
BELL ANDREW
JAYARAMAN SAIKUMAR
LIPIAN JOHN-HENRY
GOODALL BRIAN L
SHICK ROBERT A
Application Number:
PCT/US1998/018408
Publication Date:
May 27, 1999
Filing Date:
September 03, 1998
Export Citation:
Assignee:
GOODRICH CO B F (US)
International Classes:
C08F4/80; C08F232/00; C08G61/08; G03F7/004; G03F7/023; G03F7/039; G03F7/038; (IPC1-7): C08G61/08; G03F7/023
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