Title:
PHOTORESIST DEFLOCCULATION MACHINE
Document Type and Number:
WIPO Patent Application WO/2016/086463
Kind Code:
A1
Abstract:
A photoresist deflocculation machine, comprising: a machine (101), a rotating member, a transmission member (103), and an electric motor (102). The rotating member is disposed on the machine (101) and is used for driving a photoresist container (105) to rotate, and the photoresist container (105) is provided with photoresist material; the transmission member (103) is connected to the rotating member; the electric motor (102) is disposed on the machine (101) and is connected to the transmission member (103), and is used for driving the rotating member to rotate via the transmission member (103). The above design prevents the photoresist material to flocculate.
Inventors:
XU BIN (CN)
FANG CHUNG-HSIEN (CN)
XU TAO (CN)
FANG CHUNG-HSIEN (CN)
XU TAO (CN)
Application Number:
PCT/CN2014/094167
Publication Date:
June 09, 2016
Filing Date:
December 18, 2014
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
B01F9/00
Foreign References:
| CN201260949Y | 2009-06-24 | |||
| CN201357062Y | 2009-12-09 | |||
| JPS53100166A | 1978-09-01 | |||
| CN203281260U | 2013-11-13 | |||
| CN201404790Y | 2010-02-17 | |||
| CN202516509U | 2012-11-07 |
Attorney, Agent or Firm:
ESSEN PATENT&TRADEMARK AGENCY (CN)
深圳翼盛智成知识产权事务所(普通合伙) (CN)
深圳翼盛智成知识产权事务所(普通合伙) (CN)
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