PHOTORESIST PATTERN FORMING METHOD, COLOR FILTER, AND DISPLAY DEVICE

WIPO Patent Application WO/2017/049878

A1

A photoresist pattern forming method, a color filter and forming method thereof, and a display device. The photoresist pattern forming method comprises: applying a negative photoresist on a base substrate (11) to form a first photoresist layer (12), and applying a positive photoresist on the first photoresist layer (12) to form a second photoresist layer (13); performing first exposure on a first region (31) of the second photoresist layer (13), and after first developing, removing the positive photoresist in the first region (31) of the second photoresist layer (13) and the negative photoresist in a second region (32) of the first photoresist layer (12) to obtain a first photoresist pattern (100) remaining in the second photoresist layer (13) and a second photoresist pattern (200) remaining in the first photoresist layer (12); performing second exposure on the first photoresist pattern (100) and the second photoresist pattern (200), after second developing, removing the first photoresist pattern (100) and keeping the second photoresist pattern (200). The method can be applied in a forming process of a color filter, to form a black matrix with a narrow line width, thereby increasing the transmittance and aperture ratio of a display device.

LONG QINGDE (CN)
KANG YULONG (CN)
LIANG YUAN (CN)
ZHANG ZHIYONG (CN)
FAN LIWEI (CN)

PCT/CN2016/075361

March 30, 2017

March 02, 2016

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BOE TECHNOLOGY GROUP CO LTD (CN)
CHENGDU BOE OPTOELECT TECH CO (CN)

G02B5/20; G03F7/00; G03F7/20

US4533624A	1985-08-06
CN105116685A	2015-12-02
JP2000194141A	2000-07-14
EP0098922A2	1984-01-25

ZHONGZI LAW OFFICE (CN)

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