Title:
PHOTORESIST SIMULATION
Document Type and Number:
WIPO Patent Application WO/2011/059947
Kind Code:
A3
Abstract:
A processor based method for measuring dimensional properties of a photoresist profile by determining a number acid generators and quenchers within a photoresist volume, determining a number of photons absorbed by the photoresist volume, determining a number of the acid generators converted to acid, determining a number of acid and quencher reactions within the photoresist volume, calculating a development of the photoresist volume, producing with the processor a three-dimensional simulated scanning electron microscope image of the photoresist profile created by the development of the photoresist volume, and measuring the dimensional properties of the photoresist profile.
Inventors:
BIAFORE JOHN J (US)
SMITH MARK D (US)
GRAVES JOHN S (US)
BLANKENSHIP DAVID (US)
SMITH MARK D (US)
GRAVES JOHN S (US)
BLANKENSHIP DAVID (US)
Application Number:
PCT/US2010/055937
Publication Date:
October 13, 2011
Filing Date:
November 09, 2010
Export Citation:
Assignee:
KLA TENCOR CORP (US)
BIAFORE JOHN J (US)
SMITH MARK D (US)
GRAVES JOHN S (US)
BLANKENSHIP DAVID (US)
BIAFORE JOHN J (US)
SMITH MARK D (US)
GRAVES JOHN S (US)
BLANKENSHIP DAVID (US)
International Classes:
G03C5/00; H01L21/30; H01L21/027
Foreign References:
| US20030044703A1 | 2003-03-06 | |||
| US20070196747A1 | 2007-08-23 | |||
| US6081659A | 2000-06-27 | |||
| US20080243730A1 | 2008-10-02 |
Other References:
See also references of EP 2499661A4
Attorney, Agent or Firm:
MCANDREWS, Kevin (Legal DepartmentOne Technology Driv, Milpitas California, US)
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