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Patent Searching and Data


Title:
PHOTORESIST SOFTBAKING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2019/129038
Kind Code:
A1
Abstract:
A photoresist softbaking apparatus, comprising: a chamber (30) for accommodating a substrate (37) coated with photoresist; a hot plate for heating the substrate (37); a hot air knife (31) for causing the chamber to generate an airflow in a preset direction; and an exhaust port (36) disposed corresponding to the hot air knife (31) and used for exhausting photoresist particles formed after photoresist prebaking. An exhaust pipe is internally provided with a pressure-variable vacuum adsorption device (322) for adjusting an exhaust pressure to absorb the photoresist particles, and the end thereof away from the exhaust port (36) is provided with an exhaust valve (323) for controlling exhaust of the softbaking apparatus.

Inventors:
LI WEI (CN)
Application Number:
CN2018/123836
Publication Date:
July 04, 2019
Filing Date:
December 26, 2018
Export Citation:
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Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO LTD (430079, CN)
International Classes:
G03F7/16; B05D3/02
Foreign References:
CN206757298U2017-12-15
CN102553286A2012-07-11
US20080088808A12008-04-17
CN104138828A2014-11-12
JPS6269613A1987-03-30
US20050244759A12005-11-03
CN205833577U2016-12-28
Attorney, Agent or Firm:
ESSEN PATENT&TRADEMARK AGENCY (518040, CN)
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