Title:
PHOTORESIST STRIPPER COMPOSTION
Document Type and Number:
WIPO Patent Application WO/2019/109329
Kind Code:
A1
Abstract:
Provided herein is a photoresist stripper composition, which comprises at least one choline compound, at least one polar aprotic solvent, and water. The weight percentage of the choline compound is from 2.5 to 50 %, preferably from 5 to 50%, more preferably from 7 to 30%, and most preferably from 9 to 18% by weight based on the total weight of the composition. The photoresist stripper composition exhibits excellent photoresist cleaning performance and low etching to the substrate.
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Inventors:
WANG TENGFANG (CN)
WANG YONGJUN (CN)
WANG YONGJUN (CN)
Application Number:
PCT/CN2017/115196
Publication Date:
June 13, 2019
Filing Date:
December 08, 2017
Export Citation:
Assignee:
HENKEL AG & CO KGAA (DE)
ABLESTIK SHANGHAI LTD (CN)
ABLESTIK SHANGHAI LTD (CN)
International Classes:
G03F7/42; C11D7/32
Domestic Patent References:
| WO2002027409A1 | 2002-04-04 |
Foreign References:
| US20050250660A1 | 2005-11-10 | |||
| EP2098911A2 | 2009-09-09 | |||
| CN103424999A | 2013-12-04 |
Other References:
See also references of EP 3721297A4
Attorney, Agent or Firm:
NTD PATENT AND TRADEMARK AGENCY LIMITED (CN)
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