Title:
A PHOTORESIST STRIPPING COMPOSITION FOR MANUFACTURING LCD
Document Type and Number:
WIPO Patent Application WO/2011/025180
Kind Code:
A3
Abstract:
The present invention relates to a photoresist stripping composition for all process of manufacturing LCD, more specifically to a water-borne united photoresist stripping composition, as a weak basic composite comprising a tertiary alkanolamine, water, and an organic solvent. The composition according to the present invention prevents a corrosion of Al and Cu metal wiring in process of manufacturing LCD, has a good capability of removing photoresist, and is applied to all Al process, Cu process, an organic film process, and COA process.
More Like This:
| WO/2006/038341 | SUBSTRATE TREATMENT APPARATUS |
| JP2004212858 | BOARD WASHING LIQUID |
| JP6660023 | Silicon-containing resist underlayer film forming composition capable of wet removal |
Inventors:
CHOI HO SUNG (KR)
Application Number:
PCT/KR2010/005494
Publication Date:
July 07, 2011
Filing Date:
August 19, 2010
Export Citation:
Assignee:
LTC CO LTD (KR)
CHOI HO SUNG (KR)
CHOI HO SUNG (KR)
International Classes:
G03F7/42
Foreign References:
| JP2003114540A | 2003-04-18 | |||
| KR20000071361A | 2000-11-25 | |||
| JP2009014938A | 2009-01-22 | |||
| US6130195A | 2000-10-10 | |||
| JP2000214599A | 2000-08-04 | |||
| JP2005043874A | 2005-02-17 |
Attorney, Agent or Firm:
KIM, Moon Jae et al. (41-3Seosomun-dong, Jung-gu, Seoul 100-813, KR)
Download PDF:
Previous Patent: METHOD OF INDUCING THE DIFFERENTIATION OF HUMAN EMBRYONIC STEM CELLS INTO MESENCHYMAL STEM CELLS
Next Patent: SEWAGE TREATMENT SYSTEM
Next Patent: SEWAGE TREATMENT SYSTEM