Title:
PHOTOREVERSIBLE ADHESIVE AGENT
Document Type and Number:
WIPO Patent Application WO/2017/119412
Kind Code:
A1
Abstract:
The conventional photoresponsive compounds are poor in sensitivity to ultraviolet light during the liquefaction of the compounds with light, and therefore take time to liquefy. In addition, the conventional photoresponsive compounds have the disadvantage that light cannot penetrate through an adhesive layer into the back of the adhesive layer when the adhesive layer is made thick, and therefore cannot be detached satisfactorily. The present invention addresses the problem of overcoming such disadvantage of the conventional photoresponsive compounds and providing a photoresponsive adhesive agent which has high fluidization sensitivity upon the irradiation with light and can be detached easily. A photoresponsive cohesive/adhesive agent which contains, as the main component, a high-molecular-weight compound represented by general formula (1) and having a weight average molecular weight of 3000 to 800000. (In general formula (1), A represents a polymer block which is composed of a monomer represented by formula (2) and has a molecular weight of 1000 to 100000; and B represents a polymer block which has a molecular weight of 1000 to 400000, does not show light absorption by itself in a wavelength rage of 350 to 600 nm, has a glass transition temperature and a melting point that are 20ºC or lower, and has a liquid form or a plastically deformable form at room temperature. (In formula (2), R1 represents a group having an azobenzene structure represented by formula (3); n represents an integer of 2 to 18; m represents an integer of 0 to 16; and R2 represents a hydrogen atom or a methyl group.)
Inventors:
AKIYAMA HARUHISA (JP)
KIHARA HIDEYUKI (JP)
YAMASHITA AISHI (JP)
KIHARA HIDEYUKI (JP)
YAMASHITA AISHI (JP)
Application Number:
PCT/JP2017/000020
Publication Date:
July 13, 2017
Filing Date:
January 04, 2017
Export Citation:
Assignee:
NAT INST ADVANCED IND SCIENCE & TECH (JP)
International Classes:
C09J153/00; C08F293/00
Domestic Patent References:
| WO2013168712A1 | 2013-11-14 | |||
| WO2013168712A1 | 2013-11-14 |
Foreign References:
| JP5561728B2 | 2014-07-30 | |||
| JP2013249355A | 2013-12-12 | |||
| CN103819584A | 2014-05-28 | |||
| JP5360794B2 | 2013-12-04 | |||
| JP5561728B2 | 2014-07-30 |
Other References:
K.FUKUHARA ET AL.: "Liquid-Crystalline Polymer and Block Copolymer Domain Alignment Controlled by Free-Surface Segregation", ANGEWANDTE CHEMIE , INTERNATIONAL EDITION, vol. 52, no. 23, 3 June 2013 (2013-06-03), pages 5988 - 5991, XP055512328
M.SANO ET AL.: "Dynamic photoinduced realignment processes in photoresponsive block copolymer films: effects of the chain length and block copolymer architecture", SOFT MATTER, vol. 11, no. 29, 21 June 2015 (2015-06-21), pages 5918 - 5925, XP055512330
ADVANCED MATERIALS, vol. 24, 2012, pages 2353 - 2356
ACS APPL. MATER. INTERFACES, vol. 6, 2014, pages 7933 - 7941
MATYJASZEWSKI, K., MACROMOLECULES, vol. 45, 2012, pages 4015 - 4039
See also references of EP 3401377A4
M.SANO ET AL.: "Dynamic photoinduced realignment processes in photoresponsive block copolymer films: effects of the chain length and block copolymer architecture", SOFT MATTER, vol. 11, no. 29, 21 June 2015 (2015-06-21), pages 5918 - 5925, XP055512330
ADVANCED MATERIALS, vol. 24, 2012, pages 2353 - 2356
ACS APPL. MATER. INTERFACES, vol. 6, 2014, pages 7933 - 7941
MATYJASZEWSKI, K., MACROMOLECULES, vol. 45, 2012, pages 4015 - 4039
See also references of EP 3401377A4
Attorney, Agent or Firm:
HIRAKI Yusuke et al. (JP)
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