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Title:
PHOTOSENSITIVE ADHESIVE COMPOSITION HAVING ADHESIVENESS EVEN AFTER PHOTOCURING REACTION AND AFTER PATTERN FORMATION
Document Type and Number:
WIPO Patent Application WO/2011/071107
Kind Code:
A1
Abstract:
Provided is a photosensitive adhesive composition having adhesiveness even after photocuring reaction and after pattern formation, the composition attaining high adhesive strength, having heat resistance, imparting high reliability to semiconductors, and showing excellent alkali developability. The photosensitive adhesive composition having adhesiveness even after photocuring reaction and after pattern formation includes a resin composition which contains, as a main resin component, an alkali-soluble resin obtained from a product of the reaction of (meth)acrylic acid with an epoxy compound having two glycidyl ether groups and derived from a bisphenol compound, by reacting the reaction product with a) a dicarboxylic acid (or tricarboxylic acid) or the anhydride thereof and b) a tetracarboxylic acid or the dianhydride thereof, the a/b molar ratio being in the range of 0.1-10.

Inventors:
TAKANO Masaomi (15-7, Sinminato, Kisarazu-sh, Chiba 36, 〒2920836, JP)
高野 正臣 (〒36 千葉県木更津市新港15-7 新日鐵化学株式会社内 Chiba, 〒2920836, JP)
NAMEKAWA Shuhei (15-7, Sinminato, Kisarazu-sh, Chiba 36, 〒2920836, JP)
Application Number:
JP2010/072117
Publication Date:
June 16, 2011
Filing Date:
December 09, 2010
Export Citation:
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Assignee:
NIPPON STEEL CHEMICAL CO., LTD. (14-1, Sotokanda 4-chome Chiyoda-k, Tokyo 21, 〒1010021, JP)
新日鐵化学株式会社 (〒21 東京都千代田区外神田四丁目14番1号 Tokyo, 〒1010021, JP)
TAKANO Masaomi (15-7, Sinminato, Kisarazu-sh, Chiba 36, 〒2920836, JP)
高野 正臣 (〒36 千葉県木更津市新港15-7 新日鐵化学株式会社内 Chiba, 〒2920836, JP)
International Classes:
C09J163/10; C08F299/02; C08G63/676; C09J4/00; C09J11/06; C09J163/00; G03F7/027; H01L21/52
Domestic Patent References:
WO2006129669A1
Foreign References:
JPH1022641A
JPH05339356A
JP2003176343A
JP2006003860A
JP2009185270A
JPH10183088A
Attorney, Agent or Firm:
SASAKI Kazuya et al. (5th Floor, TKK Nishishinbashi Bldg. 11-5, Nishi-shinbashi 2-chome, Minato-k, Tokyo 03, 〒1050003, JP)
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