Title:
PHOTOSENSITIVE ADHESIVE COMPOSITION
Document Type and Number:
WIPO Patent Application WO2003082218
Kind Code:
A3
Abstract:
The invention relates to a photosensitive adhesive composition of the polymerisable resin type, the hardening of which occurs by means of polymerisation and/or reticulation, characterised in comprising: - initiating means for at least one chain polymerisation reaction to guarantee the hardening of said composition and a sufficient quantity of at least one bifunctional monomer, comprising a photolabile centre with at least one photolabile entity and at least two polymerisable units, connected by covalent skeletons to said photolabile centre and located away from the cleavage sites of said photolabile centre, such that said composition loses the integrity and adhesivity thereof under the influence of a reticulating radiation causing the cleavage of the photolabile sites. The composition is particularly of application in dentistry.
Inventors:
GAUD VINCENT (FR)
GNANOU YVES (FR)
DESVERGNE JEAN-PIERRE (FR)
DIERAS FRANCIS (FR)
ROUBIERE ALEXANDRINE (FR)
GNANOU YVES (FR)
DESVERGNE JEAN-PIERRE (FR)
DIERAS FRANCIS (FR)
ROUBIERE ALEXANDRINE (FR)
Application Number:
PCT/FR2003/001029
Publication Date:
April 01, 2004
Filing Date:
April 02, 2003
Export Citation:
Assignee:
PROD DENTAIRES PIERRE ROLLAND (FR)
GAUD VINCENT (FR)
GNANOU YVES (FR)
DESVERGNE JEAN-PIERRE (FR)
DIERAS FRANCIS (FR)
ROUBIERE ALEXANDRINE (FR)
GAUD VINCENT (FR)
GNANOU YVES (FR)
DESVERGNE JEAN-PIERRE (FR)
DIERAS FRANCIS (FR)
ROUBIERE ALEXANDRINE (FR)
International Classes:
A61K6/00; A61K6/083; A61K6/891; C07C245/24; C07D303/30; C07D333/36; C07F9/24; C08F220/18; C08F222/10; C08L75/16; (IPC1-7): A61K6/00; C07C245/24; C08F222/10
Domestic Patent References:
| WO1996002491A1 | 1996-02-01 | |||
| WO1996031559A1 | 1996-10-10 |
Foreign References:
| US4286047A | 1981-08-25 | |||
| EP0635534A1 | 1995-01-25 |
Other References:
NUYKEN, O. ET AL: "Laser ablation of arylazo-containing polymers", POLYMER NEWS (1999), 24(8), 257-266, XP000944985
LORMANN, MATTHIAS ET AL: "Hydro-dediazoniation of diazonium salts using trichlorosilane: new cleavage conditions for the T1 traceless linker", TETRAHEDRON LETTERS (2000), 41(20), 3813-3816, XP002224221
NUYKEN, O. ET AL: "Synthesis of Polysulfides Containing the Triazeno Group and Their Application as Photoresists in Excimer Laser Polymer Ablation", CHEMISTRY OF MATERIALS (1997), 9(2), 485-494, XP002224220
KAMOGAWA, HIROYOSHI ET AL: "Syntheses and properties of photochromic polymers of the azobenzene and thiazine series", J. POLYM. SCI., PART A-1 (1968), 6(11), 2967-91, XP001109370
DATABASE CA [online] CHEMICAL ABSTRACTS SERVICE, COLUMBUS, OHIO, US; BLEHA, MIROSLAV ET AL: "Light-sensitive composition for reproduction", XP002225925, retrieved from STN Database accession no. 81:19305
DATABASE CA [online] CHEMICAL ABSTRACTS SERVICE, COLUMBUS, OHIO, US; DONYA, A. P. ET AL: "Synthesis of triazenes and azo dyes from aminostyrenes", XP002225926, retrieved from STN Database accession no. 83:61601
WEI, J. ET AL: "Novel Laser Ablation Resists for Excimer Laser Ablation Lithography. Influence of Photochemical Properties on Ablation", JOURNAL OF PHYSICAL CHEMISTRY B (2001), 105(6), 1267-1275, XP002225924
LORMANN, MATTHIAS ET AL: "Hydro-dediazoniation of diazonium salts using trichlorosilane: new cleavage conditions for the T1 traceless linker", TETRAHEDRON LETTERS (2000), 41(20), 3813-3816, XP002224221
NUYKEN, O. ET AL: "Synthesis of Polysulfides Containing the Triazeno Group and Their Application as Photoresists in Excimer Laser Polymer Ablation", CHEMISTRY OF MATERIALS (1997), 9(2), 485-494, XP002224220
KAMOGAWA, HIROYOSHI ET AL: "Syntheses and properties of photochromic polymers of the azobenzene and thiazine series", J. POLYM. SCI., PART A-1 (1968), 6(11), 2967-91, XP001109370
DATABASE CA [online] CHEMICAL ABSTRACTS SERVICE, COLUMBUS, OHIO, US; BLEHA, MIROSLAV ET AL: "Light-sensitive composition for reproduction", XP002225925, retrieved from STN Database accession no. 81:19305
DATABASE CA [online] CHEMICAL ABSTRACTS SERVICE, COLUMBUS, OHIO, US; DONYA, A. P. ET AL: "Synthesis of triazenes and azo dyes from aminostyrenes", XP002225926, retrieved from STN Database accession no. 83:61601
WEI, J. ET AL: "Novel Laser Ablation Resists for Excimer Laser Ablation Lithography. Influence of Photochemical Properties on Ablation", JOURNAL OF PHYSICAL CHEMISTRY B (2001), 105(6), 1267-1275, XP002225924
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