Title:
PHOTOSENSITIVE COLORING COMPOSITION, CURED FILM, METHOD FOR FORMING PATTERN, COLOR FILTER, SOLID-STATE IMAGING ELEMENT AND IMAGE DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/172005
Kind Code:
A1
Abstract:
Provided are: a photosensitive coloring composition; a cured film; a method for forming a pattern; a color filter; a solid-sate imaging element; and an image display device. The photosensitive coloring composition includes: a color material; a photopolymerization initiator A1 having, in methanol, an absorption coefficient of 1.0×104 mL/gcm or greater with respect to light of a 365 nm wavelength; a photopolymerization initiator A2 having, in methanol, an absorption coefficient of 1.0×102 mL/gcm or less with respect to light of a 365 nm wavelength, and an absorption coefficient of 1.0×103 mL/gcm or greater with respect to light of a 254 nm wavelength; and a polymerizable monomer. The content of the polymerizable monomer in the total solid content of the photosensitive coloring composition is 15 mass% or greater.
Inventors:
YAMAMOTO KEIJI (JP)
Application Number:
PCT/JP2019/007156
Publication Date:
September 12, 2019
Filing Date:
February 26, 2019
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/004; C09B67/20; G02B5/20; G03F7/027; G03F7/031; G03F7/038; G09F9/30; H01L27/32; H01L51/50; H05B33/12; C07C49/83; C07C49/84
Domestic Patent References:
| WO2017141860A1 | 2017-08-24 | |||
| WO2016158114A1 | 2016-10-06 | |||
| WO2015025689A1 | 2015-02-26 |
Attorney, Agent or Firm:
SIKS & CO. (JP)
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