PHOTOSENSITIVE COMPOSITION COMPRISING ORGANIC METAL COMPOUND AND POLYSILOXANE COPOLYMER, AND PREPARATION METHOD THEREFOR

Title:

PHOTOSENSITIVE COMPOSITION COMPRISING ORGANIC METAL COMPOUND AND POLYSILOXANE COPOLYMER, AND PREPARATION METHOD THEREFOR

Document Type and Number:

WIPO Patent Application WO/2022/177332

Kind Code:

A1

Abstract:

The present invention provides a photosensitive composition and a preparation method therefor, the composition comprising a polysiloxane copolymer and an organic metal compound, which can be used for a photosensitive material for a display or a semiconductor.

Inventors:

CHA HYUK JIN (KR)
LEE EUNG CHAN (KR)
KIM KEUN SOO (KR)

Application Number:

PCT/KR2022/002381

Publication Date:

August 25, 2022

Filing Date:

February 17, 2022

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Assignee:

HUNET PLUS CO LTD (KR)

International Classes:

C08G77/04; C08G77/30; C08L83/06; C09D183/06; G03F7/075

Domestic Patent References:

WO2004031200A1	2004-04-15
WO2019129802A1	2019-07-04

Foreign References:

KR20180014961A	2018-02-12
KR20190122656A	2019-10-30
CN109705354A	2019-05-03
KR0143859B1	1998-07-01
KR100655945B1	2007-12-24

Attorney, Agent or Firm:

KWAK, Hyun Kyu (KR)

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