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Title:
PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, CURED PRODUCT, METHOD FOR PRODUCING MULTILAYER MEMBER, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT
Document Type and Number:
WIPO Patent Application WO/2023/199672
Kind Code:
A1
Abstract:
The present invention provides: a photosensitive composition which exhibits excellent pattern forming properties and low stress properties; a photosensitive film and a cured product, each of which uses this photosensitive composition; a member with a pattern; and a method for producing an electronic component. The present invention provides a photosensitive composition which contains (a) an acrylic polymer, (b) a cationically polymerizable compound and (c) a photocationic initiator, wherein: the acrylic polymer (a) contains an acrylic polymer (a0) which has a glass transition temperature of -80°C to 0°C (hereinafter the glass transition temperature may be referred to as Tg); and 10% by mass to 40% by mass of the acrylic polymer (a0) is contained in 100% by mass of the photosensitive composition.

Inventors:
MURAKAMI YUTA (JP)
TAKIGUCHI AYUMI (JP)
KATSURADA YUKI (JP)
SHIMIZU HIROO (JP)
Application Number:
PCT/JP2023/009598
Publication Date:
October 19, 2023
Filing Date:
March 13, 2023
Export Citation:
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Assignee:
TORAY INDUSTRIES (JP)
International Classes:
G03F7/038; C09J133/14; C09J163/00; G03F7/004; G03F7/40
Foreign References:
JPH1160683A1999-03-02
JP2000269650A2000-09-29
JP2020002240A2020-01-09
JP2008026667A2008-02-07
JP2010117614A2010-05-27
JP2008026660A2008-02-07
JP2021015161A2021-02-12
JP2000290501A2000-10-17
JP2002341537A2002-11-27
JP2007070448A2007-03-22
JP2000239622A2000-09-05
JP2018102159A2018-07-05
US20080248223A12008-10-09
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