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Patent Searching and Data


Title:
PHOTOSENSITIVE COMPOSITION, FILM, PATTERN FORMING METHOD, COLOR FILTER, SOLID IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/181724
Kind Code:
A1
Abstract:
Provided is a photosensitive composition which is used to form a negative pattern by development using a development liquid containing an organic solvent, and which contains a coloring material, a resin the solubility of which decreases in relation to the organic solvent by the action of an acid, and a photo-acid generator. Also provided are a film, a pattern forming method, a color filter, a solid imaging element, and an image display device which employ the photosensitive composition

Inventors:
SHIMADA KAZUTO (JP)
MURO NAOTSUGU (JP)
Application Number:
PCT/JP2019/010520
Publication Date:
September 26, 2019
Filing Date:
March 14, 2019
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/039; G02B5/20; G02F1/1335; G03F7/004; G03F7/038; G03F7/20; H01L27/146
Domestic Patent References:
WO2017057192A12017-04-06
Foreign References:
JP2016206503A2016-12-08
JP2017126044A2017-07-20
Attorney, Agent or Firm:
SIKS & CO. (JP)
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