PHOTOSENSITIVE COMPOSITION, IMAGE FORMING METHOD, FILM FORMING METHOD, RESIN, IMAGE AND FILM

Title:

PHOTOSENSITIVE COMPOSITION, IMAGE FORMING METHOD, FILM FORMING METHOD, RESIN, IMAGE AND FILM

Document Type and Number:

WIPO Patent Application WO/2017/033984

Kind Code:

A1

Abstract:

A photosensitive composition which contains a radically polymerizable monomer and a resin containing a structural unit A represented by formula (1) or formula (2) and a structural unit B represented by formula (3), formula (4) or formula (5); an image forming method; a film forming method; a resin; an image; and a film. In the formulae, each of R11, R21, R31, R41 and R51 represents H or a hydrocarbon group; each of R12-R14 and R22-R24 represents a hydrocarbon group, H, an OH group or the like; each of R42, R43, R52 and R53 represents H, a hydrocarbon group or the like; each of L1-L3 represents a single bond or a linking group; X1 represents -O- or -NR15-; X2 represents -O- or -NR25-; each of R15 and R25 represents H or a hydrocarbon group; and Cy1 represents a hydrocarbon group containing a cyclic structure that may contain O.

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Inventors:

SATO NORIAKI (JP)
SUZUKI SHOTA (JP)
SAWAMURA YASUHIRO (JP)
SLATER SEAN (JP)

Application Number:

PCT/JP2016/074706

Publication Date:

March 02, 2017

Filing Date:

August 24, 2016

Export Citation:

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Assignee:

FUJIFILM CORP (JP)

International Classes:

C08F265/06; B41J2/01; B41M5/00; C08F2/44; C08F220/34; C09D11/30

Foreign References:

JP2010054808A	2010-03-11
JP2014041322A	2014-03-06
JP2011095433A	2011-05-12
JP2010225312A	2010-10-07

Other References: