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Patent Searching and Data


Title:
PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE LITHOGRAPHY PLATE AND METHOD FOR PRODUCING LITHOGRAPHY PLATE
Document Type and Number:
WIPO Patent Application WO/2004/109402
Kind Code:
A1
Abstract:
A photosensitive composition containing a compound having a radical polymerizable group (A), a compound having a cationically polymerizable group (B), a photopolymerization initiator (C) and a binder (D) is characterized in that an iron arene complex compound and a compound containing a halogenated alkyl group are contained as the photopolymerization initiator (C).

Inventors:
MATSUMURA TOSHIYUKI (JP)
MIURA NORIO (JP)
Application Number:
PCT/JP2004/007861
Publication Date:
December 16, 2004
Filing Date:
May 31, 2004
Export Citation:
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Assignee:
KONICA MINOLTA MED & GRAPHIC (JP)
MATSUMURA TOSHIYUKI (JP)
MIURA NORIO (JP)
International Classes:
C08F20/28; C08G59/70; G03F7/00; G03F7/027; G03F7/029; G03F7/038; (IPC1-7): G03F7/027; G03F7/004; G03F7/00; G03F7/028; G03F7/029; G03F7/038
Foreign References:
JP2002509982A2002-04-02
JPH10161308A1998-06-19
JPH0726183A1995-01-27
JPH11161139A1999-06-18
JPH10239838A1998-09-11
JPH10232488A1998-09-02
JPH1060296A1998-03-03
JPH09302012A1997-11-25
JPH11322744A1999-11-24
JP2002202615A2002-07-19
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