Title:
PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE LITHOGRAPHY PLATE AND METHOD FOR PRODUCING LITHOGRAPHY PLATE
Document Type and Number:
WIPO Patent Application WO/2004/109402
Kind Code:
A1
Abstract:
A photosensitive composition containing a compound having a radical polymerizable group (A), a compound having a cationically polymerizable group (B), a photopolymerization initiator (C) and a binder (D) is characterized in that an iron arene complex compound and a compound containing a halogenated alkyl group are contained as the photopolymerization initiator (C).
Inventors:
MATSUMURA TOSHIYUKI (JP)
MIURA NORIO (JP)
MIURA NORIO (JP)
Application Number:
PCT/JP2004/007861
Publication Date:
December 16, 2004
Filing Date:
May 31, 2004
Export Citation:
Assignee:
KONICA MINOLTA MED & GRAPHIC (JP)
MATSUMURA TOSHIYUKI (JP)
MIURA NORIO (JP)
MATSUMURA TOSHIYUKI (JP)
MIURA NORIO (JP)
International Classes:
C08F20/28; C08G59/70; G03F7/00; G03F7/027; G03F7/029; G03F7/038; (IPC1-7): G03F7/027; G03F7/004; G03F7/00; G03F7/028; G03F7/029; G03F7/038
Foreign References:
| JP2002509982A | 2002-04-02 | |||
| JPH10161308A | 1998-06-19 | |||
| JPH0726183A | 1995-01-27 | |||
| JPH11161139A | 1999-06-18 | |||
| JPH10239838A | 1998-09-11 | |||
| JPH10232488A | 1998-09-02 | |||
| JPH1060296A | 1998-03-03 | |||
| JPH09302012A | 1997-11-25 | |||
| JPH11322744A | 1999-11-24 | |||
| JP2002202615A | 2002-07-19 |
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