Title:
PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHY PLATE
Document Type and Number:
WIPO Patent Application WO/2004/059387
Kind Code:
A1
Abstract:
A positive photosensitive lithography plate. An image is recorded on the plate by scanning exposure according to a digital signal, the plate with the recorded image can be developed with water or an aqueous developing agent. The developed plate or even the plate not developed can be attached to a printing machine to perform printing. A positive photosensitive composition used for the plate is also disclosed. The photosensitive composition contains (a) self-water-dispersion resin particles, (b) a photothermal converting agent, and (c) a methylol compound. The plate has a photosensitive layer composed of the photosensitive composition and provided on a support.
Inventors:
MORI TAKANORI (JP)
KOJIMA YASUHIKO (JP)
KOJIMA YASUHIKO (JP)
Application Number:
PCT/JP2003/016479
Publication Date:
July 15, 2004
Filing Date:
December 22, 2003
Export Citation:
Assignee:
KODAK POLYCHROME GRAPHICS JP (JP)
MORI TAKANORI (JP)
KOJIMA YASUHIKO (JP)
MORI TAKANORI (JP)
KOJIMA YASUHIKO (JP)
International Classes:
G03F7/004; B41C1/10; B41N1/14; G03F7/00; G03F7/033; (IPC1-7): G03F7/00; G03F7/004; G03F7/033
Domestic Patent References:
WO2001083234A1 | 2001-11-08 |
Foreign References:
JP2002362052A | 2002-12-18 | |||
JPH11348446A | 1999-12-21 | |||
JP2002192846A | 2002-07-10 | |||
EP1279520A1 | 2003-01-29 | |||
EP1160083A2 | 2001-12-05 | |||
JP2003167330A | 2003-06-13 |
Attorney, Agent or Firm:
Shiga, Masatake (Yaesu Chuo-ku, Tokyo, JP)
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