Title:
PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2013/153873
Kind Code:
A1
Abstract:
A photosensitive compound represented by formula (1) or formula (2). (Chemical formula 1) (In formula (1) and formula (2), n is an integer of 1-3; R1 is a linear or branched alkyl group having 1-6 carbon atoms or an alkylene group having 2-6 carbon atoms formed from two R1 together; R2 is -NR3R4; R3 and R4 are each independently a linear or branched alkyl group or alkenyl group having 1-6 carbon atoms, a linear or branched alkylene group having 2-6 carbon atoms formed by R3 and R4 together, or a linear or branched alkylene group or alkenylene group having 3-8 carbon atoms optionally containing an oxygen atom or nitrogen atom.)
Inventors:
SHIBUYA TORU (JP)
Application Number:
PCT/JP2013/055423
Publication Date:
October 17, 2013
Filing Date:
February 28, 2013
Export Citation:
Assignee:
TOYO GOSEI CO LTD (JP)
International Classes:
C07C233/83; C07C247/18; C07D233/61; C07D263/42; C07D295/14; C08F16/38; G03F7/012; H01L21/027
Domestic Patent References:
| WO2007125894A1 | 2007-11-08 |
Foreign References:
| JP2009510083A | 2009-03-12 | |||
| JP2003292477A | 2003-10-15 |
Other References:
CAO, YICHEN ET AL.: "Development of Structure- Lipid Bilayer Permeability Relationships for Peptide-like Small Organic Molecules", MOLECULAR PHARMACEUTICS, vol. 5, no. 3, 2008, pages 371 - 388
Attorney, Agent or Firm:
KURIHARA, Hiroyuki et al. (JP)
Hiroyuki Kurihara (JP)
Hiroyuki Kurihara (JP)
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