Title:
PHOTOSENSITIVE CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE MEMBRANE, AND METHOD FOR FORMING CONDUCTIVE PATTERN
Document Type and Number:
WIPO Patent Application WO/2011/142360
Kind Code:
A1
Abstract:
Provided is a photosensitive conductive film (10) that has a structure in which a film support (1), a conductive layer (2) containing an organic conductive material, and a photosensitive resin layer (3) are laminated in said order. The preferred organic conductive material for the photosensitive conductive film (10) is a thiophene derivative polymer, and the preferred photosensitive resin layer (3) is formed from a photosensitive resin composition comprising a binder polymer, a photopolymerizable compound having ethylenic unsaturated bonds, and a photopolymerization initiator.
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Inventors:
YAMAZAKI Hiroshi (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
山崎 宏 (〒55 茨城県日立市東町四丁目１３番１号 日立化成工業株式会社内 Ibaraki, 〒3178555, JP)
山崎 宏 (〒55 茨城県日立市東町四丁目１３番１号 日立化成工業株式会社内 Ibaraki, 〒3178555, JP)
Application Number:
JP2011/060770
Publication Date:
November 17, 2011
Filing Date:
May 10, 2011
Export Citation:
Assignee:
HITACHI CHEMICAL COMPANY, LTD. (1-1 Nishi-Shinjuku 2-chome, Shinjuku-ku Tokyo, 49, 〒1630449, JP)
日立化成工業株式会社 (〒49 東京都新宿区西新宿二丁目１番１号 Tokyo, 〒1630449, JP)
YAMAZAKI Hiroshi (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
日立化成工業株式会社 (〒49 東京都新宿区西新宿二丁目１番１号 Tokyo, 〒1630449, JP)
YAMAZAKI Hiroshi (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
International Classes:
H01B5/14; G03F7/004; G03F7/11; H01B13/00
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (SOEI PATENT AND LAW FIRM, Marunouchi MY PLAZA 9th fl. 1-1, Marunouchi 2-chome, Chiyoda-k, Tokyo 05, 〒1000005, JP)
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Claims:
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