Title:
PHOTOSENSITIVE CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE PATTERN, AND METHOD FOR MANUFACTURING CONDUCTIVE PATTERN BASE
Document Type and Number:
WIPO Patent Application WO/2018/087816
Kind Code:
A1
Abstract:
A photosensitive conductive film 4 is provided with a photosensitive resin layer 3 formed from a photosensitive resin composition having blended therein at least an iron compound, and a conductive network 2 that is provided on one main surface side of the photosensitive resin layer 3 and contains conductive fibers.
Inventors:
HIRAO KOHHEI (JP)
YOSHIHARA KENSUKE (JP)
MORI TAKUYA (JP)
YOSHIHARA KENSUKE (JP)
MORI TAKUYA (JP)
Application Number:
PCT/JP2016/083118
Publication Date:
May 17, 2018
Filing Date:
November 08, 2016
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD (JP)
International Classes:
H01B5/14; B32B7/02; B32B27/20; G06F3/041; G06F3/044; H01B13/00
Domestic Patent References:
| WO2014196154A1 | 2014-12-11 |
Foreign References:
| JP2007079442A | 2007-03-29 | |||
| JPS63124308A | 1988-05-27 | |||
| JPH06100488A | 1994-04-12 | |||
| JP2011133713A | 2011-07-07 |
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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