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Title:
PHOTOSENSITIVE ELEMENT, METHOD OF FORMING RESIST PATTERN WITH THE SAME, AND PROCESS FOR PRODUCING PRINTED WIRING BOARD
Document Type and Number:
WIPO Patent Application WO/2006/009076
Kind Code:
A1
Abstract:
A photosensitive element which comprises a support film (10), a cushioning layer (12) formed on the support film (10), and a photosensitive layer (14) having a thickness of 10 µm or smaller formed on the cushioning layer (12), characterized in that the photosensitive layer (14) is a layer comprising a binder polymer having a weight-average molecular weight of 10,000-100,000, a first photopolymerizable compound having at least one polymerizable, ethylenically unsaturated bond per molecule, and a first photopolymerization initiator and the cushioning layer (12) is a layer comprising a second photopolymerizable compound having at least one polymerizable, ethylenically unsaturated bond per molecule and a second photopolymerization initiator.

Inventors:
KUBOTA MASAO (JP)
YOSHIZAKO KIMIHIRO (JP)
TAKANO SHINJI (JP)
ISO JUNICHI (JP)
Application Number:
PCT/JP2005/013053
Publication Date:
January 26, 2006
Filing Date:
July 14, 2005
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD (JP)
KUBOTA MASAO (JP)
YOSHIZAKO KIMIHIRO (JP)
TAKANO SHINJI (JP)
ISO JUNICHI (JP)
International Classes:
C08F299/02; G03F7/004; G03F7/027; G03F7/031; G03F7/033; G03F7/11; H05K3/06; H05K3/18; (IPC1-7): G03F7/11; C08F299/02; G03F7/004; G03F7/027; G03F7/031; G03F7/033; H05K3/06; H05K3/18
Foreign References:
JP2003005364A2003-01-08
JP2001013682A2001-01-19
JP2004184547A2004-07-02
Attorney, Agent or Firm:
Hasegawa, Yoshiki (Ginza First Bldg. 10-6, Ginza 1-chom, Chuo-ku Tokyo 61, JP)
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