Title:
PHOTOSENSITIVE LITHOGRAPHY PLATE AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2005/010613
Kind Code:
A1
Abstract:
A photosensitive lithography plate is disclosed which comprises an aluminum support which is treated with an aqueous solution of an alkali metal silicate, and further treated with an aqueous solution of a polyvinyl phosphonic acid or an aqueous solution of a polymer of an unsaturated acid having a carboxyl group, and a photosensitive layer which is arranged on the aluminum support and contains an alkali-soluble resin (A) and a photothermal converter (B).
Inventors:
MIYAMOTO YASUSHI (JP)
HAYAKAWA EIJI (JP)
SHIMIZU SHINJI (JP)
HAYAKAWA EIJI (JP)
SHIMIZU SHINJI (JP)
Application Number:
PCT/JP2004/011106
Publication Date:
February 03, 2005
Filing Date:
July 28, 2004
Export Citation:
Assignee:
KODAK POLYCHROME GRAPHICS JP (JP)
MIYAMOTO YASUSHI (JP)
HAYAKAWA EIJI (JP)
SHIMIZU SHINJI (JP)
MIYAMOTO YASUSHI (JP)
HAYAKAWA EIJI (JP)
SHIMIZU SHINJI (JP)
International Classes:
B41C1/10; B41N1/08; B41N3/03; (IPC1-7): G03F7/00; B41N3/03
Foreign References:
| JP2002072501A | 2002-03-12 | |||
| JP2003057831A | 2003-02-28 | |||
| JP2000321780A | 2000-11-24 | |||
| JPH1020506A | 1998-01-23 |
Attorney, Agent or Firm:
Aoki, Atsushi (ISHIDA & ASSOCIATES Toranomon 37 Mori
Bldg., 5-1, Toranomon 3-chom, Minato-ku Tokyo 23, JP)
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